Search results for "Anodic films"
showing 10 items of 16 documents
Structural and compositional analysis of anodic films on Al-Nb sputter-deposited alloys
2006
The photoelectrochemical behavior of anodic films on Al alloys, containing titanium, tantalum, and tungsten (valve metals), has been studied as a function of alloy composition and anodizing conditions. Photocurrent spectroscopy has been used to get information on bandgap and the flatband potential values of different mixed oxides. Both insulator-like and semiconducting behavior has been observed for anodic oxides grown on Al-W and Al-Ti alloys dependent on alloy initial composition. Optical bandgap values, Eg,opt, of different oxides are in accordance with predictions based on the correlation between Eg,opt and the difference of electronegativities of the oxide constituents, indicating pote…
Kinetic of growth and physico-chemical characterization of anodic films on magnesium
2008
Growth and Characterization of Anodic Films on Scandium
2013
The anodic behavior of Sc in a slightly alkaline aqueous solution is studied. Electrochemical and capacitance measurements suggest that passive films can be formed on the scandium surface under a high electric field. The formation of these layers occurs at low faradaic efficiency due to oxygen evolution. Photoelectrochemical experiments suggest the formation of a barrier layer with a thickness high enough to hinder external electron photoemission processes and allow the estimation of the bandgap of the films as a function of their formation voltage. The estimated bandgap values were lower than that reported for Sc2O3, suggesting the formation of hydrated phases and/or of a strongly oxygen d…
Formation of anodic films on sputtering-deposited Al–Hf alloys
2009
Abstract The growth of barrier-type anodic films at high efficiency on a range of sputtering-deposited Al–Hf alloys, containing from 1 to 95 at.% Hf, has been investigated in ammonium pentaborate electrolyte. The alloys encompassed nanocrystalline and amorphous structures, the latter being produced for alloys containing from 26 to 61 at.% Hf. Except at the highest hafnium content, the films were amorphous and contained units of HfO 2 and Al 2 O 3 distributed relatively uniformly through the film thickness. Boron species were confined to outer regions of the films. The boron distributions suggest that the cation transport number decreases progressively with increasing hafnium concentration i…
The influence of surface treatment on the anodizing of magnesium in alkaline solution
2011
Abstract The mechanism of magnesium anodizing after mechanical polishing or HF pickling was studied. X-ray Photoelectron Spectroscopy and Photocurrent Spectroscopy were employed to characterize both the initial films formed on Mg soon after surface treatments and the anodic films grown in strongly alkaline solutions. Electrochemical and capacitance measurements were performed in order to study the oxidation process and to check if the kinetic of growth fits the Mott–Cabrera high field model. From Tafel plots it was possible to estimate the activation distance, while the simulation of the barrier layer growth as a function of the potential at high scan rate allowed to estimate the other kine…
The effect of thickness on the composition of passive films on a Ti–50Zr at% alloy
2006
Abstract Anodic films were grown potentiodynamically in different electrolytes (pH = 1–14) on a Ti–50Zr at% cast alloy, obtained by fusion in a voltaic arc under argon atmosphere. The thickness of the films was varied by changing formation potential from the open circuit potential up to about 9 V; growth was followed by 30 min stabilization at the forming potential. Films having different thicknesses were characterized by photocurrent spectroscopy (PCS) and electrochemical impedance spectroscopy (EIS). Moreover, film composition was analyzed by X-ray photoelectron spectroscopy (XPS). Regardless of the anodizing conditions, passive films on the Ti–50Zr at% alloy consist of a single layer mix…
Photoelectrochemical characterization of amorphous anodic films on Ti-6at.%Si
2013
Abstract The solid state properties of anodic films grown galvanostatically on sputtering-deposited Ti–6at.%Si alloys were studied as a function of the formation voltage (5–40 V). From the photocurrent spectra a band gap of ∼3.4 eV was estimated for all the investigated thicknesses, which is almost coincident with the value measured for amorphous TiO 2 . The photocharacteristics allowed to estimate the flat band potential of the films, which resulted to be more anodic for thicker layers and allowed to evidence a change from n-type semiconducting material to insulator by increasing the formation voltage. A dielectric constant of ∼31 was estimated by differential capacitance measurements. The…
Photocurrent Spectroscopy Applied to the Characterization of Passive Films on Sputter-Deposited Ti-Zr Alloys
2008
Abstract A photoelectrochemical investigation on thin (⩽13 nm) mixed oxides grown on sputter-deposited Ti–Zr alloys of different composition by air exposure and by anodizing (formation voltage, UF = 4 V/SCE) was carried out. The experimental results showed that the optical band gap, E g opt , increases with increasing Zr content in both air formed and anodic films. Such behaviour is in agreement with the theoretical expectation based on the correlation between the band gap values of oxides and the difference of electronegativity of their constituents. The flat band potential of the mixed oxides was found to be almost independent on the Ti/Zr ratio into the film and more anodic with respect …